Due to their short wavelength, X-rays can in principle be focused down to a few nanometres\nand below. At the same time, it is this short wavelength that puts stringent requirements on\nX-ray optics and their metrology. Both are limited by today�s technology. In this work, we\npresent accurate at wavelength measurements of residual aberrations of a refractive X-ray\nlens using ptychography to manufacture a corrective phase plate. Together with the fitted\nphase plate the optics shows diffraction-limited performance, generating a nearly Gaussian\nbeam profile with a Strehl ratio above 0.8. This scheme can be applied to any other focusing\noptics, thus solving the X-ray optical problem at synchrotron radiation sources and X-ray freeelectron\nlasers.
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